@article{weko_15777_1,
   author	 = "KIKUCHI,Hisaki and TAKAHASHI,Katsuyuki and MUKAIGAWA,Seiji and TAKAKI,Koichi and YUKIMURA,Ken",
   title	 = "Silicon wafer etching rate characteristics with burst width using 150 khz band high-power burst inductively coupled plasma",
   journal	 = "Micromachines",
   year 	 = "2021",
   volume	 = "12",
   number	 = "6",
   month	 = "may"
}