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Sub-nanometre Double Shearing Heterodyne Interferometry for Profiling Large Scale Planar Surfaces
https://iwate-u.repo.nii.ac.jp/records/9670
https://iwate-u.repo.nii.ac.jp/records/9670b3a894ef-1253-49db-a5ec-71b1805facce
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
mst-v15p2435-2443.pdf (3.9 MB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||
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| 公開日 | 2008-11-11 | |||||||||||||
| タイトル | ||||||||||||||
| タイトル | Sub-nanometre Double Shearing Heterodyne Interferometry for Profiling Large Scale Planar Surfaces | |||||||||||||
| キーワード | ||||||||||||||
| 主題Scheme | Other | |||||||||||||
| 主題 | heterodyne interferometer | |||||||||||||
| キーワード | ||||||||||||||
| 主題Scheme | Other | |||||||||||||
| 主題 | shearing interferometer | |||||||||||||
| キーワード | ||||||||||||||
| 主題Scheme | Other | |||||||||||||
| 主題 | profiler | |||||||||||||
| キーワード | ||||||||||||||
| 主題Scheme | Other | |||||||||||||
| 主題 | nanometer measurement | |||||||||||||
| 資源タイプ | ||||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||
| 資源タイプ | journal article | |||||||||||||
| 著者 |
Yokoyama, Toshiyuki
× Yokoyama, Toshiyuki
× Yokoyama, Shuko
× Yoshimori, Kyu
× Araki, Tsutomu
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| 著者(機関) | ||||||||||||||
| 値 | Department of Mechanical Science and Bioengineering, Graduate School of EngineeringScience, Osaka University | |||||||||||||
| 著者(機関) | ||||||||||||||
| 値 | Department of Mechanical Science and Bioengineering, Graduate School of EngineeringScience, Osaka University | |||||||||||||
| 著者(機関) | ||||||||||||||
| 値 | Department of Computer and Information Science, Faculty of Engineering,Iwate University | |||||||||||||
| 著者(機関) | ||||||||||||||
| 値 | Department of Mechanical Science and Bioengineering, Graduate School of EngineeringScience, Osaka University | |||||||||||||
| 登録日 | ||||||||||||||
| 日付 | 2008-11-11 | |||||||||||||
| 書誌情報 |
Measurement Science and Technology 巻 15, p. 2435-2443, 発行日 2004-01-01 |
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| ISSN | ||||||||||||||
| 収録物識別子タイプ | ISSN | |||||||||||||
| 収録物識別子 | 0957-0233 | |||||||||||||
| Abstract | ||||||||||||||
| 内容記述タイプ | Other | |||||||||||||
| 内容記述 | A novel interferometric method, called a double shearing interferometry, is presented for profiling large-scale quasi-planar surfaces, such as semiconductor wafers, optical flats and x-ray mirrors. The surface profile is measured even under existence of the inclination of a scanning stage. By adopting the common-path optical configuration and the heterodyne detection, the proposed method realizes excellent resolution in sub-nanometer order and enables a robust measurement against unwanted disturbances due to the measurement environments. A height resolution of 0.1nm was experimentally achieved. A standard deviation of the analytical surface profiles was found to be 1.3nm, even when using a conventional screw-lead scanning stage. The measured results show that the surface profile and stage inclination are separately determined. We confirmed resultant profile was well consistent with the one measured with Fizeau interferometer. |
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| 出版者 | ||||||||||||||
| 出版者 | IOP Publishing Ltd | |||||||||||||
| 権利 | ||||||||||||||
| 権利情報 | The original publication is available at www.iop.org | |||||||||||||
| DOI | ||||||||||||||
| 識別子タイプ | DOI | |||||||||||||
| 関連識別子 | 10.1088/0957-0233/15/12/013 | |||||||||||||
