| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2013-01-28 |
| タイトル |
|
|
タイトル |
Ion extraction from carbon shunting arc plasma |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
carbon |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
plasma density |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
arcs (electric) |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
plasma immersion ion implantation |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
plasma deposition |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
plasma production |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
plasma sheaths |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
plasma transport processes |
| 資源タイプ |
|
|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
journal article |
| 著者 |
Takaki, K.
Mukaigawa, S.
Fujiwara, T.
Kumagai, M.
Yukimura, K.
|
| 著者(機関) |
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|
値 |
Department of Electrical and Electronic Engineering, Iwate University |
| 著者(機関) |
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|
値 |
Department of Electrical and Electronic Engineering, Iwate University |
| 著者(機関) |
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|
値 |
Department of Electrical and Electronic Engineering, Iwate University |
| 著者(機関) |
|
|
値 |
Department of Electrical Engineering, Doshisha University |
| 著者(機関) |
|
|
値 |
Department of Electrical Engineering, Doshisha University |
| 登録日 |
|
|
日付 |
2013-01-28 |
| 書誌情報 |
Applied Physics Letters
巻 82,
号 16,
p. 2583-2585,
発行日 2003-04-01
|
| ISSN |
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収録物識別子タイプ |
ISSN |
|
収録物識別子 |
0003-6951 |
| Abstract |
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|
内容記述タイプ |
Other |
|
内容記述 |
The ion current characteristics of the shunting arc discharge are described in this letter. A carbon rod with 2 mm diameter and 40 mm length was employed for arc generation. The combination of the shunting arc and the negative pulse voltage applied to target is promising for plasma-based ion implantation and deposition for metallic or semimetallic three-dimensional materials. The delay time, which is defined as the time between the start of the arc current and applying the pulse voltage, was varied. The ions are extracted from the shunting arc plasma by applying a pulsed bias voltage to a target set nearby the arc source. The arc current lasts 40 μs, of which peak is 1.7 kA. The extracted target current has a sharp peak at the initial stage, followed by a stationary state. The stationary current decreases with increasing the delay time and increases with increasing the bias voltage. Under the assumption of a collisionless ion sheath, the plasma density was estimated. At the boundary between the ion sheath and the shunting arc plasma, the density was approximately 5×108 cm−3 and 3×107 cm−3 for the delay times of 100 and 1000 μs, respectively. The stationary ion current linearly increases with increasing the bias voltage and can be expressed in a simple equation. |
| 出版者 |
|
|
出版者 |
American Institute of Physics |
| 権利 |
|
|
権利情報 |
© 2003 American Institute of Physics |
| DOI |
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|
関連タイプ |
isIdenticalTo |
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|
識別子タイプ |
DOI |
|
|
関連識別子 |
10.1063/1.1568822 |
| 著者版フラグ |
|
|
出版タイプ |
VoR |
|
出版タイプResource |
http://purl.org/coar/version/c_970fb48d4fbd8a85 |
apl-v82i16p2583-2585.pdf (193.8 kB)
