| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2009-10-23 |
| タイトル |
|
|
タイトル |
Hybrid Plasma Generation Triggered by a Shunting Arc Discharge Using a Positively Biased Electrode |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Arc discharge |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
emission spectrum |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
hybrid plasma |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Paschen's Law |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
shunting arc discharge |
| 資源タイプ |
|
|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
journal article |
| 著者 |
Yukimura, Ken
Imai, Takafumi
Takaki, Koichi
Ikehata, Takashi
|
| 著者(機関) |
|
|
値 |
Department of Electrical Engineering, Doshisha University |
| 著者(機関) |
|
|
値 |
Department of Electrical Engineering, Doshisha University |
| 著者(機関) |
|
|
値 |
Department of Electronic Engineering, Iwate University |
| 著者(機関) |
|
|
値 |
Department of Electrical and Electronic Engineering, Ibaraki University |
| 登録日 |
|
|
日付 |
2009-10-23 |
| 書誌情報 |
IEEE Transactions on Plasma Science
巻 35,
号 4,
p. 1020-1026,
発行日 2007-01-01
|
| ISSN |
|
|
収録物識別子タイプ |
ISSN |
|
収録物識別子 |
0093-3813 |
| Abstract |
|
|
内容記述タイプ |
Other |
|
内容記述 |
The recent trend in thin film deposition is to prepare ceramic films capable of enduring violent environments, such as corrosive pollutant gases with high temperatures. Different kinds of plasma species existing in the same space are advantageous in order to facilitate a reactive deposition between the gaseous and metallic species. In this paper, we study a carbon shunting arc that triggers a gas discharge using a positively biased electrode. An electrode with a positive voltage of up to 500 V was set nearby the carbon shunting arc source. Nitrogen, methane, or argon was used as an ambient gas. The induced plasma was generated with a time delay from the moment of the generation of the shunting arc. The electrical and optical characteristics of the discharge were studied. The onset time of the induced plasma as a function of the ambient gas pressure has a Paschen-like V-shaped characteristic. The generated plasma includes both carbon and gaseous species. At the surface of the positively biased electrode, both spectrum emissions of carbon and gaseous species are observed, by which the plasma is confirmed to be mixed. This is based on the spectrum observation in addition to the change in the color of the plasma. A shunting arc is an easy method used in generating a hybrid plasma consisting of metallic (including carbon) and gaseous species. This method promises to efficiently prepare ceramic films by reactive deposition. This method is simple, and both plasma species, i.e., those of metal and gas particles, are easily mixed. The carbon shunting arc plasma plays both the roles of supplying the carbon species and triggering a gaseous plasma as an induced plasma. |
| 出版者 |
|
|
出版者 |
IEEE |
| 権利 |
|
|
権利情報 |
© 2007 IEEE |
| DOI |
|
|
関連タイプ |
isIdenticalTo |
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
10.1109/TPS.2007.896746 |
| 著者版フラグ |
|
|
出版タイプ |
VoR |
|
出版タイプResource |
http://purl.org/coar/version/c_970fb48d4fbd8a85 |
itps-v35n4p1020-1026.pdf (4.0 MB)
